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Silica Powder Wastewater Treatment System
    Publish time 2026-02-25 15:22    
Silica Powder Wastewater Treatment System

Silica Powder Wastewater Treatment System

Project Background

The production process uses silicon wafers as the substrate and covers surface treatment, diffusion, silicon deposition, electrode printing and soldering. The wastewater originates mainly from surface etching, texturing, phosphosilicate glass (PSG) removal and edge P-N junction removal.

Main Components of the Discharged Wastewater

Treatment Method and Results

No.Wastewater typeFlow rateMain pollutants (influent)After treatment
1High-concentration acid wastewater (surface acid etching)200 t/d (1/3 in Phase I)Fluoride (8,000 mg/L); COD (500 mg/L); TN (2,000 mg/L); SS (2,000 mg/L)Fluoride (8 mg/L); COD (70 mg/L); TN (15 mg/L); SS (50 mg/L)
2High-concentration alkaline wastewater (surface alkaline etching)1,400 t/d (1/3 in Phase I)COD (1,200 mg/L); SS (2,000 mg/L)COD (70 mg/L); SS (50 mg/L)
3Rinse wastewater2,400 t/d (1/3 in Phase I)Fluoride (200-700 mg/L); COD (500-800 mg/L); TN (50-200 mg/L); SS (50-200 mg/L)Fluoride (8 mg/L); COD (70 mg/L); TN (15 mg/L); SS (50 mg/L)